应乐小云教授邀请黄久齐博士来我院做学术报告，欢迎广大教师、同学积极参加。
题 目：Thin Film Deposition Techniques and Their Applications-Microelectronics, Optoelectronics, Flat Panel Display and Solar Energy
Thin film deposition technology is a fundamental block for many technologies, such as microelectronics, optoelectronics, flat panel display, solar energy and fuel cells. It is used in microelectronics for metallization, gate dielectrics and many other dielectrics layers; in optoelectronics for forming waveguide, modulators, laser and LED; in flat panel display for Liquid Crystal on Silicon (LCOS), a-Si TFT-LCD, low temperature polysilicon LCD, TFT-LCD array; in solar energy for both amorphous Si photovoltalic panel and crystalline Si photovoltalic panel; and fuel cells for both electrolyte and electrodes. The presentation will give a broad overview of various thin film deposition techniques – Chemical Vapor Deposition (CVD, Epitaxial CVD, MOCVD, PECVD, SACVD, LPCVD), Physical Vapor Deposition (PVD-Sputtering, RF PVD, reactive sputtering, e-beam evaporation), Atomic Layer Deposition and ion beam deposition. This presentation will also review advantages and limitations for various thin film deposition technical and their applications in microelectronics and optoelectronics.
黄久齐，中国科技大学物理系学士（1986），中国科学院物理所硕士（1989），美国宾夕法尼亚大学工程博士（1996）；1996年至2009年，先后在美国MEMC Electronics Materials担任工程专家, 美国朗讯科技公司(Lucent Technologies)担任技术参谋成员, 美国国际商业机器公司(IBM)担任顾问工程师和经理。在高温超导体材料和能源电池快离子导体材料研究开发方面取得了显著成果；曾获哥伦比亚商学院院长奖, IBM’s Bravado奖, Philips’ Star Award, Lucent/Agere’s Recognition Award, 和美国宾夕法尼亚大学Fellowship &Scholarship；共发表论文20多篇。
